Silver-assisted colloidal synthesis of gold patchy particles with tunable patchiness
Huixin Bao, Benjamin Butz, Zhou Zhou, Erdmann Spiecker, Martin Hartmann, Robin Klupp Taylor
Published in Langmuir - http://pubs.acs.org/doi/abs/10.1021/la204762z
Patchy particles possessing heterogeneous surface composition show great promise as self-organizing building blocks... more Patchy particles possessing heterogeneous surface composition show great promise as self-organizing building blocks for new classes of hierarchical functional structures. A major hurdle is the scalable synthesis of stable patches on nanosized core particles with arbitrarily defined patch number and coverage. So far, few methods have been reported which could be expected to meet these challenges. Recently we described the heterogeneous nucleation and growth of silver patches on silica nanospheres via a template free colloidal route. The patches produced, although tunable in size and number and showing interesting plasmon resonant properties, were rather unstable and degraded rapidly during attempts to process them further. In the present work, therefore, we set out to explore if related approaches can be employed to produce patchy particles involving gold, which is known to be more stable. The differences between typical patch precursors Ag+ and [AuClx(OH)4-x]- and their respective interactions with amorphous silica make this a significant challenge. We show that preformed small silver patches in addition to the presence of a reducing agent are necessary for the formation of gold patches conformal to the silica nanosphere surface. Systematic study of the process parameters and their influence on the patchiness as well as in-depth analytical TEM investigation of the patch composition reveal that patches spread over the silica surface via a cycle of galvanic dissolution and redeposition of silver.The resulting gold patchy particles remain stable during subsequent storage or washing and display tunable plasmon resonances within the visible and near-IR spectrum.
Book Review: Nanoscience Education, Workforce Training, and K-12 Resources
by Alex Broudy
Published in the Journal of Nanophotonics. Co-authored with:
Richard Doyle, Reviewer, Pennsylvania State University, Department of Science, Technology and Society, Nanofutures Working Group, University Park, Pennsylvania 16802, USA, mobius@psu.edu; Alex Broudy, Pennsylvania State University, Department of Spanish, Italian and Portuguese, Nanofutures Working Group, University Park, Pennsylvania, 16802, USA, azc5018@psu.edu; and David Saint John, Department of Materials Science and Engineering, Nanofutures Working Group, University Park, Pennsylvania 16802, USA, dbs198@psu.edu.
"Just in time for teachers, students, parents, and researchers,
Nanoscience Education, Workforce Training,... more
"Just in time for teachers, students, parents, and researchers,
Nanoscience Education, Workforce Training, and K-12 Resources offers a comprehensive and wide-ranging toolkit for
integrating the transformative effects of nanotechnology into
our schools and lives. There’s a stack of books on our desk
and a cloud of PDFs on our desktop that focus on the social
and ethical implications (SEI) of nanotech, but this 2011 collection by Judith Light Feather and Migeul F. Aznar will be
among the few “go to” texts for our classes and research in
coming years. With critical essays, lively pedagogical ideas
and techniques, and a veritable database of resources that
more than deliver on the title keyword, the book is a timely
tool for growing the best of all plausible nanotechnological
futures."
Long range ordered semiconductor interface phase and oxides
Herbots; Nicole (Tempe, AZ), Atluri; Vasudeva P. (Scottsdale, AZ), Bradley; James D. (Gilbert, AZ), Swati; Banerjee (Chandler, AZ), Hurst; Quinton B. (Tempe, AZ), Xiang; Jiong (Tempe, AZ)
A semiconductor processing method capable of producing highly ordered, ultra thin dielectrics, including gate oxide... more A semiconductor processing method capable of producing highly ordered, ultra thin dielectrics, including gate oxide and other semiconductor dielectrics, and interphase phases with low defect density. The process includes a degrease step, an etch, primary oxidation and then a passivation step which utilizes hydrofluoric acid to passivate the cleaned silicon surface with hydrogen. Dielectric layers may then be formed with low interface defect density, low flat band voltages and low fixed charge on semiconductor substrates.
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by Gola Dem
Self citation for dummies. This paper is a guide to how to increase your paper citation volume by Nelson Tansu. Tansu... more Self citation for dummies. This paper is a guide to how to increase your paper citation volume by Nelson Tansu. Tansu reveal his secret and show you how to increase your h index..
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